冲成股份有限公司
ECO 500

ECO 500

G&N

Chemical-mechanical polishing technology (CMP) with precise process control
  • Wafer polishing and planarization
  • Cost-effective solution for polishing workpieces for the following applications: epi polishing, special parts polishing and backside thinning. Suitable for reclaim and prime wafer polishing.
  • Excellent polishing results with low polishing compound consumption
  • Small footprint