冲成股份有限公司
AST-Zentura

AST-Zentura

Zentura Wafer-Level Metrology System

High-precision metrology platform that supports a wide range of measurements, including wafer thickness, adhesive thickness, and etch depth. Advanced measurement technology and performance capability achieve high-accuracy and measurement throughput on wafer up to 300mm.

Wafer level metrology solution provides flexible sensor integration options 

 。AS4000 – Optical Stylus

      .Wafer Shape – Bow, Warp, Flatness, etc.

      . Step Height / Depth Measurements

      . Multiple Measurement Range / Resolution options 

 。 AS5000 – White Light Thickness Metrology

      . Ultra-thin Silicon (1 to 50µm) Thickness Mapping

      . Thickness Mapping of Photoresist, Adhesive Layer 

 。 AS6000 – IR Thickness Metrology

      . Silicon (10 to 1200u)Thickness mapping

      . Adhesive Thickness After Bonding

      . Etch Depth Measurement

AST-Zentura supports a range of measurement technologies integrating advanced flexible sensor options developed to address critical wafer processing applications within an automated turnkey system solution. Configuration options include wafer sizes from 50mm to 300mm, with & without wafer handling.

 

Precise wafer thickness including multi-layer measurement from 10-1200 microns

Bonded wafer adhesive layer & photoresist layer measurement from 1 to 50 microns

Etch depth measurements: Trenches down to 1um width / Via down to 1um diameter

Capability to perform vision-based measurements validating line-width, feature diameter, alignment, and more with accuracy of < 0.1µm

High Throughput, up to 60 WPH

Wafer level metrology solution provides flexible sensor integration options 

 。AS4000 – Optical Stylus

      .Wafer Shape – Bow, Warp, Flatness, etc.

      . Step Height / Depth Measurements

      . Multiple Measurement Range / Resolution options 

 。 AS5000 – White Light Thickness Metrology

      . Ultra-thin Silicon (1 to 50µm) Thickness Mapping

      . Thickness Mapping of Photoresist, Adhesive Layer 

 。 AS6000 – IR Thickness Metrology

      . Silicon (10 to 1200u)Thickness mapping

      . Adhesive Thickness After Bonding

      . Etch Depth Measurement


Platform

‧300mm x 300mm X-Y Travel

‧100mm Z-axis Travel

‧ISO 5 (Class 100) Cleanroom Compatible

‧ISO 4 (Class 10) Cleanroom Option

‧Semi S2 / S8 Protocol Compliant


Optics

‧Microscope with High-Resolution camera

‧5X, 10X, 20X, 50X Objectives

‧Brightfield LED Light Source

Software

‧ScopeViewer3 Software Application Suite

‧Flexible Part-Programming

‧Advanced Vision Tools & Metrology Features 

‧SECS-GEM factory Interface 

‧Full Recipe Control of all Imaging Functions

‧Recipe Generation in Python Layer


Wafer Handling Option

 ‧System can be configured with or without wafer loader

 ‧Standard: Supports 50mm to 200mm wafers Open Cassette 

 ‧Optional: SMIF, FOUP, 300mm Wafers, Film Frame, etc.