冲成股份有限公司
AST-VCSEL

AST-VCSEL

VCSEL Optical Aperture Metrology System

The VCSEL Optical Aperture (OA) Metrology System delivers high-precision optical measurements for VCSEL (Vertical-Cavity Surface-Emitting Laser) aperture metrology. This advanced system provides precise measurements of the VCSEL oxide layer optical aperture utilizing AST's advanced infrared imaging and contrast enhancement technology, enabling manufacturers to achieve tighter process control and higher product quality and performance.

 Precise Measurements of VCSEL Oxide Layer Optical Aperture (OA)

 Optical Contrast Enhancement: Recipe Selectable Narrow Bandpass Filters

 Digital Contrast Enhancement: Recipe Control of Contrast w/ Histogram

 Advanced Infrared Imaging Technology:

        Standard: Visible Though NIR (400-1050nm)

        Optional: SWIR (900nm-1700nm)

Advanced Vision Tool Library for Executing Optimized OA Focus, Pattern Find, and Geometric Measurements 

Automated & Programmable Illumination, Wavelength Selection, Aperture Diaphragm, and Camera Exposure / Gain ensures best QA Edge Contrast and Repeatability

 

The VCSEL OA Metrology System provides advanced measurement capability to execute critical inspection criteria utilizing advanced imaging technology with precise automation to measure VCSEL aperture dimensions with exceptional accuracy and repeatability.  The system features multi-spectral capabilities that allow for comprehensive inspection across visible, NIR, and SWIR wavelengths, capturing detailed data on aperture geometry, position, and uniformity.

 

Precise measurements of VCSEL oxide layer optical aperture

Advanced pattern recognition for precise aperture identification

Comprehensive data analysis and reporting capabilities

Automated & programmable illumination & wavelength selection for optimum edge contrast

Advanced IR imaging technology – visible through NIR (400-1050nm)

Capability to expand IR imaging technology using SWIR (900nm-1700nm)

Fully automated wafer handling configurations supporting wafers from 50mm to 200mm with options supporting up to 300mm

 

VCSEL aperture diameter, roundness, ratio, & chord metrology

Dual & multi-aperture array alignment verification

OA inspection using AI defect detection 

Process variation monitoring and control

Critical dimension metrology for VCSEL manufacturing

Quality assurance in high-volume production environments

Research and development of next-generation VCSEL devicess

Platform

‧300mm x 300mm X-Y Travel

‧100mm Z-axis Travel

‧ISO 5 (Class 100) Cleanroom Compatible

‧ISO 4 (Class 10) Cleanroom Option

‧Semi S2 / S8 Protocol Compliant

‧Light Tower for System Status


Optics

‧Automated, High-Resolution Optical System

‧5X, 10X, 20X, 50X, & 100X BF IR Objectives

‧Optional BF/DF Objectives for NIR

‧Can mix NIR & BF/DF Obj. on Turret 

‧Broadband or LED Light Source

‧Standard Video Auto-Focus

‧BOptional Tracking Laser Auto-Focus

Software

‧ScopeViewer3 Software Application Suite

‧Flexible Part-Programming

‧Advanced Vision Tools & Metrology Features 

‧SECS-GEM factory Interface 

‧Full Recipe Control of all Imaging Functions

‧Recipe Generation in Python Layer

‧Flexible Configuration for Long Term Support of Hardware and Software Components


Wafer Handling Option

 ‧System can be configured with or without wafer loader

 ‧Standard: Supports 50mm to 200mm wafers Open Cassette 

 ‧Optional: SMIF, FOUP, 300mm Wafers, Film Frame, etc.