冲成股份有限公司
AST-IR Automated

AST-IR Automated

Automated NIR/SWIR Metrology & Inspection System

The AST-IR delivers breakthrough subsurface inspection capabilities for silicon and other wafer materials. This automated system penetrates through silicon to reveal hidden defects and alignment issues in bonded dies, wafers, and MEMS devices. By leveraging advanced NIR and SWIR imaging technology, the system provides critical insights for 3D stacking, wafer bonding, and failure analysis applications.

Inspection of Sub Surface Structures on Si and other wafer materials

Optical Contrast Enhancement: Recipe Selectable Band-Pass, Long-Pass Filters

Digital Contrast Enhancement: Recipe Control of Contrast w/ Histogram

Advanced Infrared Imaging Technology:

     Standard: Visible Though NIR (400-1050nm)

     Optional: SWIR (900nm-1700nm)

     Optional: High-Resolution Options

Automated & Programmable Illumination, Wavelength Selection, Aperture Diaphragm, and Camera Exposure / Gain ensures best Image Contrast

Advanced Vision Tool Library for Executing Optimized OA Focus, Pattern Find, and Geometric Measurements

 

The Automated NIR/SWIR Metrology & Inspection System  combines high-resolution imaging with programmable automation to address complex inspection challenges. The system features recipe-selectable optical filters and digital contrast enhancement tools to maximize visibility of subsurface features across different material types.

 

Automated, high-resolution optical system with magnification options from 5X to 100X

Flexible wafer handling supporting 50mm to 300mm wafers with various cassette options

Programmable illumination with recipe-controlled wavelength selection and filter wheels

Advanced camera options: NIR (4M to 25M pixel) and SWIR (640x512 or 1280x1024 InGaAs)

ScopeViewer3 software with advanced vision tools for pattern finding and geometric measurements

Comprehensive factory integration with SECS-GEM interface and recipe generation in Python

 

Pre & post bonded die inspection for die-to-die layer alignment in 3D stacking

Wafer-to-wafer layer alignment verification for 3D stacking

Die-to-wafer bonding alignment

Internal inspection and metrology on MEMS devices

Semiconductor failure analysis

Subsurface inspection using NIR (up to 1100nm) for low-doped material and SWIR (900-1650nm) for highly doped wafers

Platform

300+mm x 300+mm w/ 100mm Z-axis Travel

‧ISO 5 (Class 100) Cleanroom Compatible

‧ISO 4 (Class 10) Cleanroom Option

‧Semi S2 / S8 Protocol Compliant

‧Light Tower for System Status


Optics

‧Automated, High-Resolution Optical System

‧5X, 10X, 20X, 50X, & 100X BF IR Objectives

‧Optional BF/DF Objectives for NIR

‧Can mix NIR & BF/DF Obj. on Turret

‧Broadband or LED Light Source

‧Standard Video Auto-Focus

‧Optional Tracking Laser Auto-Focus

Wafer Handling Option

‧System can be configured with or without wafer loader

‧Standard: Supports 50mm to 200mm wafers Open Cassette

‧Optional: SMIF, FOUP, 300mm Wafers, Film Frame, Etc